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Related paper 1) Jaemin Lee, Changmok Kim, Hyun Woo Lee, and Kwang-Ho Kwon, “Sidewall chemistry of nano-contact patterns in C4F8+CH2F2+O2+Ar inductively coupled plasmas”, Thin Solid Films, Vol.669, 227-234, (2019). https://doi.org/10.1016/j.tsf.2018.11.009 Redirecting linkinghub.elsevier.com 2) Jaemin Lee, Hyun Woo Lee, Kwang-Ho Kwon, “Characteristics of etching residues on the upper sidewall after anisotropi.. 2020. 8. 28.
Related paper 1) Junmyung Lee, Yunho Nam, Jongchan Lee, and Kwang-Ho Kwon, “Etching characteristics of thin SiON films using a liquefied perfluorocarbon precursor of C6F12O with a low global warming potential”, Plasma Science & Technology, accepted 10, June (2020) https://iopscience.iop.org/article/10.1088/2058-6272/ab9b5a/pdf 2) Jaemin Lee, Jihun Kim, Junmyung Lee, Hyun Woo Lee and Kwang-Ho Kwon “Plasma Etch.. 2020. 8. 28.
Related paper 1) Byungwhan Kim and Kwang-Ho Kwon, “Modeling Magnetically Enhanced RIE of Aluminum Alloy Films Using Neural Networks”, IEEE Transaction on Semiconductor Manufacturing, Vol. 11. No. 4. pp.692-695. Nov, 1998 https://doi.org/10.1109/66.728566 Modeling magnetically enhanced RIE of aluminum alloy films using neural networks - IEEE Journals & Magazine ieeexplore.ieee.org 2) Seung-Youl Kang, Sang-Kyun.. 2020. 8. 28.
Related paper 1) Sun Jin Yun, Kwang-Ho Kwon, Byung-Sun Park, Young-Jin Jeon, and Sang-Won Kang, "The formation of resist profile by TMSDEA-treatment and dry development based on oxygen-helium RIE", Microelectronic Engineering, Vol. 13, 115(1991) https://doi.org/10.1016/0167-9317(91)90060-Q Redirecting linkinghub.elsevier.com 2) Hyung-Ho Park, Kwang-Ho Kwon, Sang-Hwan Lee, Sahn Nahm, Hee-Tae Lee, Kyoung-Ik Cho.. 2020. 8. 27.
Nano-materials Ammonia-based plasma treatment of single-walled carbon nanotube thin films for bio-immobilization Etching characteristics and mechanisms of MoS2 2D crystals in O2/Ar inductively coupled plasma Direct transfer of graphene by control of polydimethylsiloxane surface energy Nanomaterials are chemical substances or materials that are manufactured and used at a very small scale. Nanomaterials are deve.. 2020. 8. 27.
Nanopattern sidewall analysis There is a growing demand for the miniaturization and large-scale integration of semiconductor devices. In order to meet the requirements of the semiconductor industry, plasma etching processes using fluorocarbon-based gases have been developed to achieve vertically etched profiles for the formation of contact holes with high aspect ratios (HARs). In HAR contact etching, the slope of the etched .. 2020. 8. 27.

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