Member/Students10 Jinhyuk Kim Name : Jinhyuk Kim Degree : M.S candidate E-mail : kimjh9621@korea.ac.kr Research area : High aspect ratio oxide etching characteristics using C6F12O with low-GWP and comparative study of 2 MHz and 13.56 Mhz Published. 1) Jinhyuk Kim, Gilyoung Choi, and Kwang0Ho Kwon, : “High-aspect-ratio oxide etching using CF4/C6F12O) plasma in an inductively coupled plasma etching system with low-frequency bi.. 2023. 11. 13. Gil-Young Choi Name : Gil-Young Choi Degree : Ph. D. Candidate E-mail : confidencism@korea.ac.kr Research area : A study on the high-aspect-ratio oxide etching characteristics using a Hexafluoroisobutylene with a low global warming potential 2023. 11. 13. Junmyung Lee Name : Junmyung Lee Degree : Ph. D. Candidate E-mail : lee_jm@korea.ac.kr Research area : Plasma etching (L-PFC precursor, low-k film) & Plasma damage (Dielectric constant) Published. 1) Junmyung Lee, Inwoo Chun, Moonkeun Kim, Kwang-Ho Kwon, and Hyun Woo Lee, "A Study on the Fabrication and Characterization of Micro Pb(Zr,Ti)O3 Film Piezoelectric Cantilever Using MEMS Process for Energy Harvesti.. 2020. 8. 27. Jaemin Lee Name : Jaemin Lee Degree : Ph. D. Candidate E-mail : jaemin_lee@korea.ac.kr Research area : Plasma etching, Sidewall analysis Published. 1) Jaemin Lee, Alexander Efremov and Kwang-Ho Kwon, “On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios”, Vacuum, 214-223, (2018) https:/.. 2020. 8. 27. Jongchan Lee Name : Jongchan Lee Degree : Ph. D. Candidate E-mail : jongchanlee@korea.ac.kr Research area : Metal oxide TFT Published. 1) Jongchan Lee, Alexander Efremov, Kwangsoo Kim and Kwang-Ho Kwon, “Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2 mixing ratio”, Japanese Journal of Applied Physics 55, 106201 (2016) https://iopscience.iop.org.. 2020. 8. 27. Nomin Lim Name : Nomin Lim Degree : Ph. D. Candidate E-mail : nomin_lim@korea.ac.kr Research area : The ICP etching process and plasma diagnosis study for high selective etching Published. 1) Nomin Lim, Alexander Efremov, Geun Young Yeom, and Kwang-Ho Kwon “On the Etching Characteristics and Mechanisms of HfO2 Thin Films in CF4/O2/Ar and CHF3/O2/Ar Plasma for nano-device”, J. Nanosci. Nanotechnol. 14, 967.. 2020. 8. 27. 이전 1 2 다음
