1) Junmyung Lee, Yunho Nam, Jongchan Lee, and Kwang-Ho Kwon, “Etching characteristics of thin SiON films using a liquefied perfluorocarbon precursor of C6F12O with a low global warming potential”, Plasma Science & Technology, accepted 10, June (2020) https://iopscience.iop.org/article/10.1088/2058-6272/ab9b5a/pdf
2) Jaemin Lee, Jihun Kim, Junmyung Lee, Hyun Woo Lee and Kwang-Ho Kwon “Plasma Etching of SiON Films Using Liquefied C7F14 Gas as Perfluorocarbon Alternative”, Science of Advanced Materials, Vol. 12. pp. 641-646, 2020 https://doi.org/10.1166/sam.2020.3677
Plasma Etching of SiON Films Using Liquefied C7F14 Gas as Perfluo...: Ingenta Connect
In this study, we evaluated the possibility of replacing existing perfluorocarbon gas with C7F14, which can be recovered in its liquid state from room-temperature air. We performed plasma etching of SiON films using the CF4 + X + O2 mixed gas, where X = CH
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