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2) Hyung-Ho Park, Kwang-Ho Kwon, Sang-Hwan Lee, Sahn Nahm, Hee-Tae Lee, Kyoung-Ik Cho, Oh-Joon Kwon, and Young Il Kang, "A Study on Modified Silicon Surface after CHF3/C2F6 Reactive Ion Etching", ETRI journal, vol. 16, No. 1, p45-57, (1994) https://doi.org/10.4218/etrij.94.0194.0014

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5) Kwang-Ho Kwon, Chang-Il Kim, Sun Jin Yun, Guen-Yong Yeom, "Etching Properties of Pt Thin Films by inductively coupled Plasma", Journal of Vacuum Science & Technology A. vol. 16, no. 5, pp. 2772 – 2776, (1998) https://doi.org/10.1116/1.581420

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6) Kyu-Ha Baek, Kwang-Ho Kwon, Sun Jin Yun, Chang-il Kim, Jong-Moon Park, Yong-Sun Yoon, and Kee -Soo Nam, “ The role of Sulfur during Mo Etching Using SF6 and Cl2 gas chemistries”, Journal of Materials Science Letters, vol 17, pp. 1483 – 1486, Sept. 1998 https://link.springer.com/article/10.1023/A:1026434619677

 

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11) Kwang-Ho Kwon, Seung-Youl Kang, Geun-Young Yeom, Nam-Kwan Hong, and Jin Ho Lee, “Etch Characteristics of Pt by using Cl2/Ar/O2 Gas Mixtures”, Journal of The Electrochemical Society, 147(5) pp. 1807-1809 (2000) https://iopscience.iop.org/article/10.1149/1.1393438/meta

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