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Reseach Area/Nanopattern sidewall analysis

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by 플라즈마응용연구실 2020. 8. 28.

1) Jaemin Lee, Changmok Kim, Hyun Woo Lee, and Kwang-Ho Kwon, “Sidewall chemistry of nano-contact patterns in C4F8+CH2F2+O2+Ar inductively coupled plasmas”, Thin Solid Films, Vol.669, 227-234, (2019). https://doi.org/10.1016/j.tsf.2018.11.009

 

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2) Jaemin Lee, Hyun Woo Lee, Kwang-Ho Kwon, “Characteristics of etching residues on the upper sidewall after anisotropic plasma etching of silicon”, Applied Surface Science, Vol. 517, 146189 (2020) https://doi.org/10.1016/j.apsusc.2020.146189

 

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