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Taehoon Lee Name : Taehoon Lee Graduate year : 2010 Degree : M. S Affiliation : Samsung Electronics E-mail : sebiny@korea.ac.kr Published. 1) Taehoon Lee, Alexander Efremov, Yong-Hyun Ham, Sun Jin Yun, Nam-Ki Min, MunPyo Hong, and Kwang-Ho Kwon, “Etching characteristics and mechanism of vanadium dioxide in inductively coupled Cl2/Ar plasma”, J. Micro/Nanolith. MEMS MOEMS 8, 021110 (2009) https://doi.org/10... 2020. 8. 27.
Mansu Kim Name : Mansu Kim Graduate year : 2008 Degree : M. S Affiliation : - E-mail : happyvt@naver.com Published. 1) Nam-Ki Min, Mansu Kim and Kwang-Ho Kwon, Alexander Efremov, Hyun Woo Lee, and Sungihl Kim, “Etch Characteristics of Ge2Sb2Te5 (GST), SiO2 and a Photoresist in an Inductively Coupled Cl2/Ar Plasma”, Journal of the Korean Physical Society, Vol. 51, No. 5, November 2007, pp. 1686_1694 https:.. 2020. 8. 27.
Junmyung Lee Name : Junmyung Lee Degree : Ph. D. Candidate E-mail : lee_jm@korea.ac.kr Research area : Plasma etching (L-PFC precursor, low-k film) & Plasma damage (Dielectric constant) Published. 1) Junmyung Lee, Inwoo Chun, Moonkeun Kim, Kwang-Ho Kwon, and Hyun Woo Lee, "A Study on the Fabrication and Characterization of Micro Pb(Zr,Ti)O3 Film Piezoelectric Cantilever Using MEMS Process for Energy Harvesti.. 2020. 8. 27.
Jaemin Lee Name : Jaemin Lee Degree : Ph. D. Candidate E-mail : jaemin_lee@korea.ac.kr Research area : Plasma etching, Sidewall analysis Published. 1) Jaemin Lee, Alexander Efremov and Kwang-Ho Kwon, “On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios”, Vacuum, 214-223, (2018) https:/.. 2020. 8. 27.
Jongchan Lee Name : Jongchan Lee Degree : Ph. D. Candidate E-mail : jongchanlee@korea.ac.kr Research area : Metal oxide TFT Published. 1) Jongchan Lee, Alexander Efremov, Kwangsoo Kim and Kwang-Ho Kwon, “Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2 mixing ratio”, Japanese Journal of Applied Physics 55, 106201 (2016) https://iopscience.iop.org.. 2020. 8. 27.
Nomin Lim Name : Nomin Lim Degree : Ph. D. Candidate E-mail : nomin_lim@korea.ac.kr Research area : The ICP etching process and plasma diagnosis study for high selective etching Published. 1) Nomin Lim, Alexander Efremov, Geun Young Yeom, and Kwang-Ho Kwon “On the Etching Characteristics and Mechanisms of HfO2 Thin Films in CF4/O2/Ar and CHF3/O2/Ar Plasma for nano-device”, J. Nanosci. Nanotechnol. 14, 967.. 2020. 8. 27.

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