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Youngkeun Kim Name : Youngkeun Kim Graduate year : 2012 (M. S), 2020 (Ph. D) Degree : Ph. D Affiliation : Dongbuhitek Co. LTD E-mail : ygkim57@korea.ac.kr Published. 1) Yong Geun Kim, Nomin Lim, Jihun Kim, Changmok Kim, Junmyung Lee, Kwang-Ho Kwon, “Study on the surface energy characteristics of polydimethylsiloxane (PDMS) films modified by C4F8/O2/Ar plasma treatment”, Applied Surface Science, Vol. 31, 198-2.. 2020. 8. 27.
Jinyoung Son Jinyoung Son Graduate year : 2014 Degree : M. S Affiliation : LG Chem, Ltd E-mail : son_jy@korea.ac.kr Published. 1) Jinyoung Son, Alexander Efremov, Inwoo Chun, Geun Young Yeom, and Kwang-Ho Kwon, “On the LPCVD-formed SiO2 Etching Mechanism in CF4/Ar/O2 Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas”, Plasma Chemistry and Plasma Processing, (2014), 34:239-257 https://doi.org/.. 2020. 8. 27.
Yong-Hyun Ham Name : Yong-Hyun Ham Graduate year : 2013 Degree : Ph. D Affiliation : SEMES E-mail : hamcos@korea.ac.kr Published. 1) Yong-Hyun Ham, Alexander Efremov, Sun Jin Yun, Jun Kwan Kim, Nam-Ki Min, Kwang-Ho Kwon, “Etching characteristics and mechanism of ZnO thin films in inductively coupled HBr/Ar plasma”, Thin Solid Films, Vol. 517, Issue 14, Pages 4242-4245 https://doi.org/10.1016/j.tsf.2009.02.008.. 2020. 8. 27.
Hanbyeol Jang Name : Hanbyeol Jang Graduate year : 2013 Degree : M. S Affiliation : Inform, Co. Ltd E-mail : hbjang84@korea.ac.kr Published. 1) Hanbyeol Jang, Alexander Efremov, Daehee Kim, Sungchil Kang, Sun Jin Yun, Kwang-Ho Kwon, Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas, Plasma Chemistry and Plasma Processing, (2012) 32:333-342. https://doi... 2020. 8. 27.
Sungchil Kang Name : Sungchil Kang Graduate year : 2013 Degree : M. S Affiliation : Hyundai Heavy Industries E-mail : kangsungchil@korea.ac.kr Published. 1) Sungchil Kang, Alexander Efremov, Sun Jin Yun, Jinyoung Son, and Kwang-Ho Kwon, “Etching Characteristics and Mechanisms of Mo and Al2O3 Thin Films in O2/Cl2/Ar Inductively Coupled Plasmas: Effect of Gas Mixing Ratios”, Plasma Chemistry and Plasma Processi.. 2020. 8. 27.
Daehee Kim Name : Daehee Kim Graduate year : 2012 Degree : M. S Affiliation:Samsung Electronics E-mail : daeheekim@korea.ac.kr Published. 1) Daehee Kim, Alexander Efremov, Hanbyeol Jang, Sungchil Kang, Sun Jin Yun, Kwang-Ho Kwon, “Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl2/Ar Inductively Coupled Plasma”, Jpn. J. Appl. Phys. Vol. 51, no. 10, 106201-1-5 https://doi.org/10.1143/JJAP... 2020. 8. 27.