- Name : Jongchan Lee
- Degree : Ph. D. Candidate
- E-mail : jongchanlee@korea.ac.kr
- Research area : Metal oxide TFT
Published.
1) Jongchan Lee, Alexander Efremov, Kwangsoo Kim and Kwang-Ho Kwon, “Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2 mixing ratio”, Japanese Journal of Applied Physics 55, 106201 (2016) https://iopscience.iop.org/article/10.7567/JJAP.55.106201/pdf
2) Jongchan Lee, Alexander Efremov, Kwangsoo Kim, and Kwang-Ho Kwon, “On the Etching Mechanisms of SiC Thin Films in CF4/CH2F2/N2/Ar Inductively Coupled Plasma” Plasma Chem. Plasma Process, Vol. 37(2), 489-509 (2017) https://doi.org/10.1007/s11090-016-9781-7
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