Junmyung Lee

Name : Junmyung Lee
Degree : Ph. D. Candidate
E-mail : lee_jm@korea.ac.kr
Research area : Plasma etching (L-PFC precursor, low-k film) & Plasma damage (Dielectric constant)

Published.

1) Junmyung Lee, Inwoo Chun, Moonkeun Kim, Kwang-Ho Kwon, and Hyun Woo Lee, "A Study on the Fabrication and Characterization of Micro Pb(Zr,Ti)O3 Film Piezoelectric Cantilever Using MEMS Process for Energy Harvesting", Journal of KIEEME 26(11), 831-835 (2013). doi.org/10.4313/JKEM.2013.26.11.831

A Study on the Fabrication and Characterization of Micro Pb(Zr,Ti)O₃ Film Piezoelectric Cantilever Using MEMS Process

Abstract In this study, we fabricated a micro $Pb(Zr,Ti)O_3$ (PZT) film piezoelectric cantilever with a Si proof mass and dual beams through MEMS process. The size of the beam and the integrated Si proof mass were about $4,320{\mu}m{\times}290{\mu}m{\times

koreascience.or.kr

2) Junmyung Lee, Alexander Efremov, Geun Young Yeom, Nomin Lim and Kwang-Ho Kwon, “Application of Si and SiO2 Etching Mechanisms in CF4/C4F8/Ar Inductively Coupled Plasmas for Nanoscale Patterns”, J. Nanosci. Nanotechnol. 15, 8340-8347, (2015) https://doi.org/10.1166/jnn.2015.11256

Application of Si and SiO2 Etching Mechanisms in CF4/C4F8/Ar Indu...: Ingenta Connect

An investigation of the etching characteristics and mechanism for both Si and SiO2 in CF4/C4F8/Ar inductively coupled plasmas under a constant gas pressure (4 mTorr), total gas flow rate (40 sccm), input power (800 W), and bias power (150 W) was performed.

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3) Junmyung Lee, Alexander Efremov, Geun Young Yeom, Nomin Lim, Kwang-Ho Kwon, "Silicon Surface Modification Using C4F8+O2 Plasma for Nano-Imprint Lithography", J. Nanosci. Nanotechnol. 15, 8749-8755, (2015) https://doi.org/10.1166/jnn.2015.11511

Silicon Surface Modification Using C4F8+O2 Plasma for Nano-Imprin...: Ingenta Connect

The investigation of C4F8+O2 feed gas composition on both plasma parameters and plasma treated silicon surface characteristics was carried out. The combination of plasma diagnostics by Langmuir probes and plasma modeling indicated that an increase in O2 mi

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4) Junmyung Lee, Alexander Efremov, Byung Jun Lee, and Kwang-Ho Kwon, “Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr + Ar Inductively Coupled Plasmas”, Plasma chemistry and plasma processing , 36, p1571-1588 (2016) https://doi.org/10.1007/s11090-016-9737-y

5) Junmyung Lee, Kwang-Ho Kwon, Alexander Efremov, "Plasma parameters and active species kinetics in CF4/O2/Ar gas mixture: effects of CF4/O2 and O2/Ar mixing ratios", SPIE Proceedings, 10224 (2016) https://doi.org/10.1117/12.2266348

Plasma parameters and active species kinetics in CF4/O2/Ar gas mixture: effects of CF4/O2 and O2/Ar mixing ratios

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6) Junmyung Lee, Jihun Kim, Byung Jun Lee, Jongchan Lee, Hyun Woo Lee, Min-Hee Hong, Hyung-Ho Park, Dong Il Shim, Hyung Hee Cho, and Kwang-Ho Kwon, “Characterization of Mesoporous Silica Thin Films for Application to Thermal Isolation Layer”, Thin Solid Films, Vol.660, 715-719, (2018). https://doi.org/10.1016/j.tsf.2018.04.001

Redirecting

linkinghub.elsevier.com

7) Junmyung Lee, Jihun Kim, Changmok Kim, Alexander Efremov, Hyun Woo Lee and Kwang-Ho Kwon, “Etching Kinetics and Surface Conditions for SiOxNy Thin Films in CF4+CHF3+O2 Inductively Coupled Plasma”, Plasma Chemistry and Plasma Processing, Vol.39 (4) 1127-1144, (2019) https://doi.org/10.1007/s11090-019-09973-w

8) Junmyung Lee, Yunho Nam, Jongchan Lee, and Kwang-Ho Kwon, “Etching characteristics of thin SiON films using a liquefied perfluorocarbon precursor of C6F12O with a low global warming potential”, Plasma Science & Technology, accepted 10, June (2020) https://iopscience.iop.org/article/10.1088/2058-6272/ab9b5a/pdf