Jinyoung Son

Jinyoung Son
Graduate year : 2014
Degree : M. S
Affiliation : LG Chem, Ltd
E-mail : son_jy@korea.ac.kr

Published.

1) Jinyoung Son, Alexander Efremov, Inwoo Chun, Geun Young Yeom, and Kwang-Ho Kwon, “On the LPCVD-formed SiO2 Etching Mechanism in CF4/Ar/O2 Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas”, Plasma Chemistry and Plasma Processing, (2014), 34:239-257 https://doi.org/10.1007/s11090-013-9513-1

2) Jinyoung Son, Alexander Efremov, Sun Jin Yun, Geun Young Yeom, and Kwang-Ho Kwon “Etching Characteritics and Mechanism of SiNx Films for Nano-devices in CH2F2/O2/Ar Inductively Coupled Plasma: Effect of O2 Mixing Ratio”, J. Nanosci. Nanotechnol. 14, 9368-9372 (2014) https://doi.org/10.1166/jnn.2014.10182

Etching Characteristics and Mechanism of SiN x ...: Ingenta Connect

Etching characteristics and mechanisms of low-temperature SiN x thin films for nano-devices in CH2F2/O2/Ar inductively-coupled plasmas were studied. The etching rates of SiN x thin films as well as the etching selectivities over Si and photoresist were mea

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3) Jinyoung Son, Min-Sik Kim, Hyun Woo Lee, Jong-Sung Yu, and Kwang-Ho Kwon,

“Surface modification of polypropylene separators in lithium-ion batteries using inductively coupled plasma treatment.”, J. Nanosci. Nanotechnol. Vol. 14, 9368-9372, 2014 https://doi.org/10.1166/jnn.2014.10119

Surface Modification of Polypropylene Separators in Lithium-Ion B...: Ingenta Connect

We describe herein an improvement in the surface wettability of plasma-treated separators for use in lithium-ion batteries. We treated the separators with an O2/Ar inductively coupled plasma to increase their surface energy. The plasma treatment on the sep

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