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Member/Alumni

Youngkeun Kim

by 플라즈마응용연구실 2020. 8. 27.

 

  • Name : Youngkeun Kim
  • Graduate year : 2012 (M. S), 2020 (Ph. D)
  • Degree : Ph. D
  • Affiliation : Dongbuhitek Co. LTD
  • E-mail : ygkim57@korea.ac.kr

Published.

1) Yong Geun Kim, Nomin Lim, Jihun Kim, Changmok Kim, Junmyung Lee, Kwang-Ho Kwon, “Study on the surface energy characteristics of polydimethylsiloxane (PDMS) films modified by C4F8/O2/Ar plasma treatment”, Applied Surface Science, Vol. 31, 198-203, (2019) https://doi.org/10.1016/j.apsusc.2017.11.009

 

Redirecting

 

linkinghub.elsevier.com

2) Yong Geun Kim, Changmok Kim, Junmyung Lee, Hyun Woo Lee and Kwang-Ho Kwon, “Direct transfer of graphene by control of polydimethylsiloxane surface energy”, Thin Solid Films, Vol.697, 137847 (2020), 08, Feb. (2020) https://doi.org/10.1016/j.tsf.2020.137847

 

Redirecting

 

linkinghub.elsevier.com

3) Youngkeun Kim, Sungchil Kang, Young-Hyun Ham, and Kwang-Ho Kwon, Dimitriy Alexandrovich Shutov, Hyun-Woo Lee, Jae Jong Lee, Lee-Mi Do, and Kyu-Ha Baek, “Study on surface modification of silicon using CHF3/O2 plasma for nano-imprint lithography”, J. Vac. Sci. Technol. A 30(3), 03160-1 https://doi.org/10.1116/1.3695995

 

Study on surface modification of silicon using CHF3/O2 plasma for nano-imprint lithographya)

In this article, we report the surface modification of silicon by an inductively coupled CHF3/O2 plasma treatment for demolding process in nano-imprint lithography. The effects of O2 addition to th...

avs.scitation.org

4) Yong Geun Kim, Jummyung Lee, Hyun Woo Lee, and Kwang-Ho Kwon, “Etching Chracteristics of Graphene Film for Electronic Devices Using Inductively Coupled Plasma”, J. Nanosci. Nanotechnol. 16,11986-11991 (2016) https://doi.org/10.1166/jnn.2016.13630

 

Etching Characteristics of Graphene Film for Electronic Devices U...: Ingenta Connect

In this work, we studied the etching characteristics of graphene film in O2/Ar inductively coupled plasmas. We determined the relationship between the plasma state and the change in the graphene surface to understand the etch mechanism. The resistance of t

www.ingentaconnect.com

 

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