전체 글179 Jaemin Lee Name : Jaemin Lee Degree : Ph. D. Candidate E-mail : jaemin_lee@korea.ac.kr Research area : Plasma etching, Sidewall analysis Published. 1) Jaemin Lee, Alexander Efremov and Kwang-Ho Kwon, “On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios”, Vacuum, 214-223, (2018) https:/.. 2020. 8. 27. Jongchan Lee Name : Jongchan Lee Degree : Ph. D. Candidate E-mail : jongchanlee@korea.ac.kr Research area : Metal oxide TFT Published. 1) Jongchan Lee, Alexander Efremov, Kwangsoo Kim and Kwang-Ho Kwon, “Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2 mixing ratio”, Japanese Journal of Applied Physics 55, 106201 (2016) https://iopscience.iop.org.. 2020. 8. 27. Nomin Lim Name : Nomin Lim Degree : Ph. D. Candidate E-mail : nomin_lim@korea.ac.kr Research area : The ICP etching process and plasma diagnosis study for high selective etching Published. 1) Nomin Lim, Alexander Efremov, Geun Young Yeom, and Kwang-Ho Kwon “On the Etching Characteristics and Mechanisms of HfO2 Thin Films in CF4/O2/Ar and CHF3/O2/Ar Plasma for nano-device”, J. Nanosci. Nanotechnol. 14, 967.. 2020. 8. 27. Byungjun Lee Name : Byungjun Lee Degree : Ph. D. Candidate E-mail : byung_jun@korea.ac.kr Research area : Development of ion and neutral species control methodolog Published. 1) Byung Jun Lee, Alexander Efremov, Junmyung Lee, and Kwang-Ho Kwon, “Etching kinetics and mechanisms of SiC thin films in F‑, Cl- and Br‑based plasma chemistries”, Plasma Chemistry and Plasma Processing, Vol.39, 325-338, (2019). https.. 2020. 8. 27. Yunho Nam Name : Yunho Nam Degree : M.S Candidate E-mail : yhnam09@korea.ac.kr Research area : Plasma etching (PFC, L-PFC precursor) 2020. 8. 27. Younghun Oh Name : Younghun Oh Degree : M.S Candidate E-mail : 5678mark@korea.ac.kr Research area : Plasma etching (ITO) 2020. 8. 27. 이전 1 ··· 4 5 6 7 8 9 10 ··· 30 다음
