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Thin film deposition Thin Film Deposition is the technology of applying a very thin film of material – between a few nanometers to about 100 micrometers, or the thickness of a few atoms – onto a “substrate” surface to be coated, or onto a previously deposited coating to form layers. Thin Film Deposition manufacturing processes are at the heart of today’s semiconductor industry, solar panels, CDs, disk drives, and op.. 2020. 8. 27.
Sensor and Electrical device In this study, the high-performance transparent Al:InZnSnO /InZnO/Al:InZnSnO (AIZTO/IZO/AIZTO) tri-layer thin-film phototransistors are reported. They show a high field-effect mobility of 40.1 cm2/V·s and an excellent high photoresponsivity of 25,000 A/W, a photosensitivity of 3.3×107, a specific detectivity of 4.3×1017 cm·Hz1/2·W-1 under the illumination at 460 nm with an intensity of 140 μW/cm.. 2020. 8. 27.
L-PFC etching Plasma etching has been widely applied in nano patterning processes for precise pattern transfer. Purfluoro carbon (PFC) based gas has been widely used for nanopatterning. However, PFC gas has a global warming potential (GWP) of over 8,000, which has a significant negative impact on the ozone layer. Therefore, in order to overcome environmental problems, the process applicability of liquefied PF.. 2020. 8. 27.
Lab. Photo 2020. 8. 27.
Plasma etching characteristics Plasma etching is one of the main applications of plasma treatment and the plasma system (known as a ‘plasma etcher’) is commonly used in production of semiconductor devices. During plasma etching, the highly energetic and reactive species produced from a selected process gas, such as O2 or a fluorine bearing gas, bombard and react with the sample surface and, as a result, the materials at the s.. 2020. 8. 27.
Changmok Kim Name : Changmok Kim Graduate year : 2019 Degree : M. S Affiliation: SEMES E-mail:cmke@korea.ac.kr Published. 1) Changmok Kim, Alexander Efremov, Jaemin Lee, Il Ki Han, Young-Hwan Kim, and Kwang-Ho Kwon, “Kinetics and mechanisms for ion-assisted etching of InP thin films in HBr + Cl2 + Ar inductively coupled plasma with various HBr/Cl2 mixing ratios”, Thin Solid Films, Vol.660, 590-595, (2018). h.. 2020. 8. 27.

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