- Name : Daehee Kim
- Graduate year : 2012
- Degree : M. S
- Affiliation:Samsung Electronics
- E-mail : daeheekim@korea.ac.kr
Published.
1) Daehee Kim, Alexander Efremov, Hanbyeol Jang, Sungchil Kang, Sun Jin Yun, Kwang-Ho Kwon, “Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl2/Ar Inductively Coupled Plasma”, Jpn. J. Appl. Phys. Vol. 51, no. 10, 106201-1-5 https://doi.org/10.1143/JJAP.51.106201
Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl2/Ar Inductively Coupled Plasma - IOPscience
The TiO2 etching characteristics and mechanism in HBr/Cl2/Ar inductively coupled plasma (with a fixed bias power of 200 W) were investigated. It was found that the TiO2 etching rate in Cl2/Ar plasma is about 8 times faster than that in HBr/Ar plasma. In bo
iopscience.iop.org
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