Reseach Area/Plasma etch mechanism & modeling2 Related paper 1) Byungwhan Kim and Kwang-Ho Kwon, “Modeling Magnetically Enhanced RIE of Aluminum Alloy Films Using Neural Networks”, IEEE Transaction on Semiconductor Manufacturing, Vol. 11. No. 4. pp.692-695. Nov, 1998 https://doi.org/10.1109/66.728566 Modeling magnetically enhanced RIE of aluminum alloy films using neural networks - IEEE Journals & Magazine ieeexplore.ieee.org 2) Seung-Youl Kang, Sang-Kyun.. 2020. 8. 28. Plasma Etch mechanism and plasma modeling 2014. 9. 1. 이전 1 다음
