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Reseach Area/Nanopattern sidewall analysis2

Related paper 1) Jaemin Lee, Changmok Kim, Hyun Woo Lee, and Kwang-Ho Kwon, “Sidewall chemistry of nano-contact patterns in C4F8+CH2F2+O2+Ar inductively coupled plasmas”, Thin Solid Films, Vol.669, 227-234, (2019). https://doi.org/10.1016/j.tsf.2018.11.009 Redirecting linkinghub.elsevier.com 2) Jaemin Lee, Hyun Woo Lee, Kwang-Ho Kwon, “Characteristics of etching residues on the upper sidewall after anisotropi.. 2020. 8. 28.
Nanopattern sidewall analysis There is a growing demand for the miniaturization and large-scale integration of semiconductor devices. In order to meet the requirements of the semiconductor industry, plasma etching processes using fluorocarbon-based gases have been developed to achieve vertically etched profiles for the formation of contact holes with high aspect ratios (HARs). In HAR contact etching, the slope of the etched .. 2020. 8. 27.

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