Reseach Area/Liquefied-PFC precursor etching2 Related paper 1) Junmyung Lee, Yunho Nam, Jongchan Lee, and Kwang-Ho Kwon, “Etching characteristics of thin SiON films using a liquefied perfluorocarbon precursor of C6F12O with a low global warming potential”, Plasma Science & Technology, accepted 10, June (2020) https://iopscience.iop.org/article/10.1088/2058-6272/ab9b5a/pdf 2) Jaemin Lee, Jihun Kim, Junmyung Lee, Hyun Woo Lee and Kwang-Ho Kwon “Plasma Etch.. 2020. 8. 28. L-PFC etching Plasma etching has been widely applied in nano patterning processes for precise pattern transfer. Purfluoro carbon (PFC) based gas has been widely used for nanopatterning. However, PFC gas has a global warming potential (GWP) of over 8,000, which has a significant negative impact on the ozone layer. Therefore, in order to overcome environmental problems, the process applicability of liquefied PF.. 2020. 8. 27. 이전 1 다음
