Mansu Kim

 

•  Name : Mansu Kim
•  Graduate year : 2008
•  Degree : M. S
•  Affiliation : -
•  E-mail : happyvt@naver.com

Published.

1) Nam-Ki Min, Mansu Kim and Kwang-Ho Kwon, Alexander Efremov, Hyun Woo Lee, and Sungihl Kim, “Etch Characteristics of Ge2Sb2Te5 (GST), SiO2 and a Photoresist in an Inductively Coupled Cl2/Ar Plasma”, Journal of the Korean Physical Society, Vol. 51, No. 5, November 2007, pp. 1686_1694 https://doi.org/10.3938/jkps.51.1686

2) Mansu Kim, Nam-Ki Min, Sun Jin Yun, Hyun Woo Lee, Alexander Efremov, and Kwang-Ho Kwon, “On the etching mechanism of ZrO2 thin films in inductively coupled BCl3/Ar plasma”, Microelectronic Engineering 85 (2008) 348 – 354 (Feb) https://doi.org/10.1016/j.mee.2007.07.009

Redirecting

3) Mansu Kim, Nam-Ki Min, Sun Jin Yun, Hyun Woo Lee, Alexander Efremov, and Kwang-Ho Kwon, “Effect of Gas Mixing Ratio on Etch Behavior of ZrO2 Thin Films in BCl3/He Inductively Coupled Plasma”, J. Vac. Sci. Technol. A 26(3), May/June 2008, pp. 344 – 351 https://doi.org/10.1116/1.2891255

Effect of gas mixing ratio on etch behavior of ZrO2 thin films in BCl3∕He inductively coupled plasma

4) Mansu Kim, Nam-Ki Min, Sun Jin Yun, Hyun Woo Lee, Alexander M. Efremov, and Kwang-Ho Kwon, “Model-Based Analysis of the ZrO2 Etching Mechanism in Inductively Coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas”, ETRI Journal, Vol 30, No. 3, June 2008, pp. 383 – 393 (June) https://doi.org/10.4218/etrij.08.0107.0206

Model‐Based Analysis of the ZrO2 Etching Mechanism in Inductively Coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas

5) Mansu Kim, Nam-Ki Min, Alexander Efremov, Hyun Woo Lee, Chi-Sun Park, and Kwang-Ho Kwon, Model-based analysis of the silica glass film etch mechanism in CF4/O2 inductively coupled plasma, J. Mater. Sci: Mater Electron, vol 19 (2008) pp. 957 – 964 (Oct) https://doi.org/10.1007/s10854-007-9425-z