- Name : Taehoon Lee
- Graduate year : 2010
- Degree : M. S
- Affiliation : Samsung Electronics
- E-mail : sebiny@korea.ac.kr
Published.
1) Taehoon Lee, Alexander Efremov, Yong-Hyun Ham, Sun Jin Yun, Nam-Ki Min, MunPyo Hong, and Kwang-Ho Kwon, “Etching characteristics and mechanism of vanadium dioxide in inductively coupled Cl2/Ar plasma”, J. Micro/Nanolith. MEMS MOEMS 8, 021110 (2009) https://doi.org/10.1117/1.3100423
Etching characteristics and mechanism of vanadium dioxide in inductively coupled Cl2/Ar plasma
1 April 2009 Etching characteristics and mechanism of vanadium dioxide in inductively coupled Cl2/Ar plasma Author Affiliations + Tae-Hoon Lee,1 Alexander M. Efremov,2 Yong-Hyun Ham,1 Sun Jin Yun,3 Nam-Ki Min,1 Munpyo Hong,1 Kwang-Ho Kwon1 1Korea Univ. (Ko
www.spiedigitallibrary.org
2) Taehoon Lee, Nam-Ki Min, Hyun Woo Lee, JinNyoung Jang, DongHyuck Lee, MunPyo Hong, and, Kwang-Ho Kwon, “The deposition of amorphous carbon thin films for hard mask applications by reactive particle beam assisted sputtering process”, Thin Solid Films, Vol. 517, Issue 14, 3999-4002 https://doi.org/10.1016/j.tsf.2009.01.112
Redirecting
linkinghub.elsevier.com
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