- Name : Jinhyuk Kim
- Degree : M.S candidate
- E-mail : kimjh9621@korea.ac.kr
- Research area : High aspect ratio oxide etching characteristics using C6F12O with low-GWP and comparative study of 2 MHz and 13.56 Mhz
Published.
1) Jinhyuk Kim, Gilyoung Choi, and Kwang0Ho Kwon, : “High-aspect-ratio oxide etching using CF4/C6F12O) plasma in an inductively coupled plasma etching system with low-frequency bias power”, Plasma Process Polym. 2023;e2200167, https://doi.org/10.1002/ppap.202200167
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