- Name : Jaemin Lee
- Degree : Ph. D. Candidate
- E-mail : jaemin_lee@korea.ac.kr
- Research area : Plasma etching, Sidewall analysis
Published.
1) Jaemin Lee, Alexander Efremov and Kwang-Ho Kwon, “On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios”, Vacuum, 214-223, (2018) https://doi.org/10.1016/j.vacuum.2017.11.029
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2) Jaemin Lee, Junmyung Lee, Hyun Woo Lee, and Kwang-Ho Kwon, “Anti-adhesive characteristics of CHF3/O2 and C4F8/O2 plasma-modified silicon molds for nanoimprint lithography”, Materials Research Bulletin 69 (2015) 120-125. https://doi.org/10.1016/j.materresbull.2014.12.023
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3) Jaemin Lee, Alexander Efremov, Ryeo Gang Son, Seung Pil Pack, Hyun Woo Lee, Kwangsoo Kim and Kwang-Ho Kwon, “Ammonia-based plasma treatment of single-walled carbon nanotube thin films for bio-immobilization”, Carbon, 105, p430-437 (2016) https://doi.org/10.1016/j.carbon.2016.04.061
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4) Jaemin Lee, Alexander Efremov, Junmyung Lee, Kwangsoo Kim, and Kwang-Ho Kwon, “Etching Characteristics of Carbon Nanotube Thin Films in O2/Ar Plasma”, J. Nanosci. Nanotechnol. 16,12021-12027 (2016) https://doi.org/10.1166/jnn.2016.13637
Etching Characteristics of Carbon Nanotube Thin Films in O2/Ar Pl...: Ingenta Connect
In this work, we studied the influence of O2/Ar mixing ratio on the etching characteristics of carbon nanotube (CNT) thin films in inductively coupled plasma at constant gas pressure (6 mTorr), input power (400 W), bias power (50 W), and total gas flow rat
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5) Jaemin Lee, Changmok Kim, Hyun Woo Lee, and Kwang-Ho Kwon, “Sidewall chemistry of nano-contact patterns in C4F8+CH2F2+O2+Ar inductively coupled plasmas”, Thin Solid Films, Vol.669, 227-234, (2019). https://doi.org/10.1016/j.tsf.2018.11.009
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6) Jaemin Lee, Hyun Woo Lee, Kwang-Ho Kwon, “Characteristics of etching residues on the upper sidewall after anisotropic plasma etching of silicon”, Applied Surface Science, Vol. 517, 146189 (2020) https://doi.org/10.1016/j.apsusc.2020.146189
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7) Jaemin Lee, Jihun Kim, Junmyung Lee, Hyun Woo Lee and Kwang-Ho Kwon “Plasma Etching of SiON Films Using Liquefied C7F14 Gas as Perfluorocarbon Alternative”, Science of Advanced Materials, Vol. 12. pp. 641-646, 2020 https://doi.org/10.1166/sam.2020.3677
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