Nomin Lim

 

• Name : Nomin Lim
• Degree : Ph. D. Candidate
• E-mail : nomin_lim@korea.ac.kr
• Research area : The ICP etching process and plasma diagnosis study for high selective etching

Published.

1) Nomin Lim, Alexander Efremov, Geun Young Yeom, and Kwang-Ho Kwon “On the Etching Characteristics and Mechanisms of HfO2 Thin Films in CF4/O2/Ar and CHF3/O2/Ar Plasma for nano-device”, J. Nanosci. Nanotechnol. 14, 9670-9679 (2014) https://doi.org/10.1166/jnn.2014.10171

On the Etching Characteristics and Mechanisms of HfO2 Thin Films ...: Ingenta Connect

2) Nomin Lim, Alexander Efremov, Geun Young Yeom, Bok-Gil Choi, and Kwang-Ho Kwon “Etching characteristics and mechanisms of Mo thin films in Cl2/Ar and CF4/Ar inductively coupled plasmas”, Japanese Journal of Applied Physics, 53, 116201(2014) https://doi.org/10.7567/JJAP.53.116201

 

 

3) Nomin Lim, Alexander Efremov, and Kwang-Ho Kwon, “Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8+Ar inductively coupled plasma”, Thin Solid Films, Vol. 685, 97-107, (2019) https://doi.org/10.1016/j.tsf.2019.05.066

Redirecting

4) Nomin Lim, Alexander Efremov, Hyun-Gyu Hwang, Sahn Nahm and Kwang-Ho Kwon, “Etching Kinetics and Surface Conditions for  KNbxOy Thin Films with Fluorine‑ and Chlorine‑Based Plasma Chemistries”, Plasma Chemistry and Plasma Processing, 40, 625-640 (2020) https://doi.org/10.1007/s11090-020-10064-4

 

 

5) Nomin Lim, Il Ki Han, Young-Hwan Kim, Hyun Woo Lee, Yunsung Cho, Jeong-Su Kim, Yeon-Ho Im and Kwang-Ho Kwon, “Abnomal characteristics of etched profile on thick dielectrics for MEMS in inductively coupled plasma”, Vacuum, 166, 45-49 (2019) https://doi.org/10.1016/j.vacuum.2019.04.054

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6) Nomin Lim, Daewoong Hong, Jaehwa Jeong, Hyun Woo Lee and Kwang-Ho Kwon, “Inductively Coupled Plasma Surface Modification of Polyethylene Terephthalate and Application in a Trib oelectric Generator” Thin Solid Films, Vol. 637, 27-31(2017) https://doi.org/10.1016/j.tsf.2017.03.034

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7) Nomin Lim, Daewoong Hong, Jaehwa Jeong, Hyun Woo Lee and Kwang-Ho Kwon, “Surface Modification Due to Plasma Treatment of an Aluminum Electrode for a Triboelectric Generator”, J. Nanosci Nanotechnol. vol. 17, 3328-3332 (2017) https://doi.org/10.1166/jnn.2017.14092

Surface Modification Due to Plasma Treatment of an Aluminum Elect...: Ingenta Connect