Member23 Byungjun Lee Name : Byungjun Lee Degree : Ph. D. Candidate E-mail : byung_jun@korea.ac.kr Research area : Development of ion and neutral species control methodolog Published. 1) Byung Jun Lee, Alexander Efremov, Junmyung Lee, and Kwang-Ho Kwon, “Etching kinetics and mechanisms of SiC thin films in F‑, Cl- and Br‑based plasma chemistries”, Plasma Chemistry and Plasma Processing, Vol.39, 325-338, (2019). https.. 2020. 8. 27. Yunho Nam Name : Yunho Nam Degree : M.S Candidate E-mail : yhnam09@korea.ac.kr Research area : Plasma etching (PFC, L-PFC precursor) 2020. 8. 27. Younghun Oh Name : Younghun Oh Degree : M.S Candidate E-mail : 5678mark@korea.ac.kr Research area : Plasma etching (ITO) 2020. 8. 27. Yeonsik Choi Name : Yeonsik Choi Degree : M.S Candidate E-mail : xptm798@korea.ac.kr Research area : Plasma etching (ITO) 2020. 8. 27. Professor Profile Education1978 - 1985 Bachelor’s Degree in Electrical Engineering, Korea University 1985 - 1987 M. S in Electrical Engineering, Korea University 1987 - 1993 Ph. D in Electrical Engineering (Electrical and Electronic Materials ) Ph. D. Thesis : “Characterization of Silicon Contamination and damage caused by reactive ion etching and its removal” Professor Career1987 – 1995 Senior Researcher, Electr.. 2014. 9. 1. 이전 1 2 3 4 다음
