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Reseach Area/Thin film deposition

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by 플라즈마응용연구실 2020. 8. 28.

1) Taehoon Lee, Nam-Ki Min, Hyun Woo Lee, JinNyoung Jang, DongHyuck Lee, MunPyo Hong, and, Kwang-Ho Kwon, “The deposition of amorphous carbon thin films for hard mask applications by reactive particle beam assisted sputtering process”, Thin Solid Films, Vol. 517, Issue 14, 3999-4002 https://doi.org/10.1016/j.tsf.2009.01.112

 

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2) Sun Gyu Choi, Tae-Jung Ha, Hyung-Ho Park, Sangwoo Shin, Hyung Hee Cho, Kwang-Ho Kwon, and MunPyo Hong, “Effective heat conservation in a sandwich-structured microbolometer using mesoporous TiO2 layers”, Sensors and Actuators A 155 (2009) 131135 https://doi.org/10.1016/j.sna.2009.08.008

 

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3) Sun Gyu CHOI, A. Sivasankar REDDY, MunPyo HONG, Kwang-Ho KWON, and Hyung-Ho PARK, “Size effect of substitutional alkaline-earth elements on the electrical and structural properties of LaMnO3 films”, Journal of the Ceramic Society of Japan 117 [11] 1249-1253 2009 https://doi.org/10.2109/jcersj2.117.1249

 

Size effect of substitutional alkaline-earth elements on the electrical and structural properties of LaMnO3 films

Abstract Tolerance factor controlled Mn-based colossal magnetoresistance (CMR) thin films (La0.7Ca0.3MnO3, La0.7Sr0.3MnO3, La0.7Sr0.11Ba0.19MnO3, and La0.7Ba0.3MnO3) which have the same content of divalent cation and Mn3+/Mn4+ ratio were deposited on amorp

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4) Sun Gyu Choi, Seok-Joo Wang, and Hyung-Ho Park, MunPyo Hong, and Kwang-Ho Kwon, “Effects of dopant ion and Mn valence state in the La1xAxMnO3 (A=Sr, Ba) colossal magnetoresistance films” J. Vac. Sci. Technol. A 28 (1), 2010 15 https://doi.org/10.1116/1.3256197

 

Effects of dopant ion and Mn valence state in the La1−xAxMnO3 (A=Sr,Ba) colossal magnetoresistance films

The structural and electrical properties of Mn-based colossal magnetoresistance (CMR) thin films with controlled tolerance factor and Mn ion valance ratio were studied using crystal structure and c...

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5) Kum-Pyo Yoo, Myung Jin Lee, Kwang-Ho Kwon, Jaehwa Jeong, Nam-Ki Min, “Dielectric properties of on-chip-cured polyimide films”, Thin Solid Films, Volume 518, Issue 21, 31 August 2010, Pages 5986-5991 https://doi.org/10.1016/j.tsf.2010.05.099

 

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6) S. G. Choi, S.-J. Wang, H.-H. Park, J.-N. Jang, M. P. Hong, K.-H. Kwon, and H.-H. Park, “Properties of amorphous silicon thin films synthesized by reactive particle beam assisted chemical vapor deposition”, Thin Solid Films, Volume 518, Issue 24 (2010) Pages 7372-7376 https://doi.org/10.1016/j.tsf.2010.05.006

 

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7) DongHyeok Lee, JinNyoung Jang, Kwang-Ho Kwon, SukJae You, BonJu Lee, and MunPyo Hong, “Influence of argon neutral beam energy on the structural properties of amorphous carbon thin films grown by neutral particle beam assisted sputtering”, Thin Solid Films 519 (2011) 67036707 https://doi.org/10.1016/j.tsf.2011.04.063

 

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8) Sun Gyu CHOI, Jin-Nyoung JANG, MunPyo HONG, Kwang-Ho KWON and Hyung-Ho PARK, Effect of reflector bias voltage on the nanocrystallization of silicon thin films by reactive particle beam assisted chemical vapor deposition, Journal of the Ceramic Society of Japan 119 [12] 922-925 2011 https://doi.org/10.2109/jcersj2.119.922

 

Effect of reflector bias voltage on the nanocrystallization of silicon thin films by reactive particle beam assisted chemical va

Abstract In the present study, the effects of reflector bias voltage on the physical and chemical properties of nanocrystalline silicon deposited by reactive particle beam assisted chemical vapor deposition were systematically studied using various reflect

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9) Sun Gyu Choi , Hyung-Ho Park, Jin-Nyoung Jang, MunPyo Hong, and Kwang-Ho Kwon, “Effect of plasma source power on the nanocrystallization of silicon thin films by reactive particle beam assisted chemical vapor deposition”, Ceramics International 38S (2011) S641-S644 https://doi.org/10.1016/j.ceramint.2011.05.116

 

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10) Sungchil Kang, Hyun Woo Lee, Mun Pyo Hong, and Kwang-Ho Kwon, “Electrical and mechanical characteristics of room temperature deposited silicon nitride using inner two parallel cylindrical coil inductively coupled plasma chemical vapor deposition”, J. Nanosci. Nanotechnol. Vol. 13, 6326-6332, 2013 https://doi.org/10.1166/jnn.2013.7706

 

11) Sungchil Kang, Hyun Woo Lee, MunPyo Hong, and Kwang-Ho Kwon, “Characteristics of room temperature silicon nitride deposited by Internal Inductively Coupled Plasma Chemical Vapor Deposition”, J. Nanosci. Nanotechnol. Vol. 14, 6189-6195 (2014) https://doi.org/10.1166/jnn.2014.8816

 

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