Education
1978 - 1985 Bachelor’s Degree in Electrical Engineering, Korea University
1985 - 1987 M. S in Electrical Engineering, Korea University
1987 - 1993 Ph. D in Electrical
Engineering (Electrical and Electronic Materials )
Ph. D. Thesis : “Characterization of Silicon Contamination and damage caused by reactive ion etching and its removal”
Professor Career
1987 – 1995 Senior
Researcher, Electronics and Telecommunications Research Institute (ETRI)
1995 – 2005 Associate Professor, Hanseo
University, Electronic Engineering
2004 General Director, The Korean
Institute of Electrical and Electronic Material Engineers (KIEEME)
2005 - Professor, Korea
University, Control & Instrumentation Engineering
2008 Financial
director, The Korean Institute of Electrical and Electronic Material Engineers (KIEEME)
2012 Committee Member, Chungcheongnam-do Future
Planning Research Group, Transportation Machinery Research
Association
2012 – 2014 Head of Faculty Education, Korea
Univ. The Faculty of Education
2014 Cooperative director, The Korean Institute of Electrical and Electronic Material Engineers (KIEEME)
2014 Associate Editor of journal “Proceeding
of Higher School. Ser. Chemistry and Chemical Technology”
2014 Strategic Planning Board, Korea Evaluation Institute of Industrial Technology
2014 – 2016 Head
of Science & Technology College, Korea Univ.
2015 Vice Chairman, The Korean Institute of Electrical and Electronic Material Engineers (KIEEME)
2016 The University of Texas at Arlington - UT Arlington – UTA Visiting Professor
2017 KIST(Nano-Photonic Laboratory Center) – Visiting Professor
2017 – 2020 Senior Director, Daejeon-Tecno Park
2020 – Editor of journal "Materials", Special Issue "Etching Kinetics and Mechanisms of Thin Films" Website
Awards
1. 한국 전기전자재료 학회 2008년 논문상 (2008)
2. ETRI journal 논문상 수상 (SCI) (2009)
3. International Biographical Centre, Cambridge England (IBC) 인명 사전 등재 (2009)
4. American Biographical Institute (ABI) 인명 사전 등재 (2009)
5. JSTS (Journal of Semiconductor Technology and Science) 최다 논문 인용 감사패 시상 (2011)
6. 고려대학교 세종캠퍼스 석탑연구상 (2010 ~ 2016)
7. Marquis Who’s who 인명 사전 등재 (2009 ~ 2020)
Patents (2014 ~ )
● 국내특허
1. 권광호, 손진영 “식각 종말점 검출 장치 및 식각 종말점 검출 방법”, 등록번호(10-1358538)
2. 권광호, 천인우 “플라즈마 뷰포트 식각 장치”, 등록번호(10-1348001)
3. 권광호, 박강박 “식각 종말점 검출 장치 및 식각 종말점 검출 방법”, 등록번호(10-1356853)
4. 권광호, 이재민, 강봉기 “입자형 곡면 거울 장치 및 이의 제조 방법”, 등록번호(10-1629147)
5. 권광호, 이재민 “정전 용량성 습도 센서 및 이의 제조 방법”, 등록번호(10-1647555)
6. 권광호, 이준명, 이종찬 "적외선 센서의 제조 방법", 등록번호(1018271370000)
7. 권광호, 이준명, 이종찬 "적외선 센서 및 이의 제조 방법", 등록번호(1028271380000)
● 국제특허
1. Device for producing inductively coupled plasma and method thereof,
US 7,090,742
Papers (SCI (1991 ~ 2020) - 164 papers)
(2015 ~ )
1. Inwoo Chun, Alexander
Efremov, Geun Young Yeom, and Kwang-Ho Kwon “A Comparative Study of CF4/O2/Ar
and C4F8/O2/Ar Plasmas for Dry Etching
Applications” Thin Solid Films, 579 (2015) 136-143
2. Jaemin Lee, Junmyung Lee, Hyun Woo Lee, and Kwang-Ho Kwon, “Anti-adhesive characteristics of CHF3/O2 and C4F8/O2 plasma-modified silicon molds for nanoimprint lithography, Materials Research Bulletin 69 (2015) 120-125 September
3. Kwangsoo Kim, Alexander Efremov, Junmyung Lee, Geun Young Yeom, and Kwang-Ho Kwon “Etching Mechanisms of (In, Ga, Zn)O Thin Films in CF4/Ar/O2 Inductively Coupled Plasma, JVST A, published 26 February 2015
4. Junmyung Lee, Alexander Efremov, Jaemin Lee, Geun Young Yeom, and Kwang-Ho Kwon, “Silicon Surface Modification Using C4F8 + O2 Plasma for nano-Implant Lithography”, J. Nanosci. Nanotechnol. 15, 8749-8755, (2015)
5. Junmyung Lee, Alexander Efremov, Geun Young Yeom, Nomin Lim and Kwang-Ho Kwon, “Application of Si and SiO2 Etching Mechanisms in CF4/C4F8/Ar Inductively Coupled Plasmas for Nanoscale Patterns”, J. Nanosci. Nanotechnol. 15, 8340-8347, (2015)
6. Alexander Efremov, Joon Hyub, and Kwang-Ho Kwon, “A Model-Based Comparative Study of HCl and HBr Plasma Chemistries for Dry Etching Purposes”, Plasma chemistry and plasma processing , 35(6), p1129-1142 (2015)
7. Chang-Sun Park, Hong-Sub Lee, Dong Il Shim, Hyung hee Cho, Hyung-Ho Park and Kwang-Ho Kwon, “Oxygen-deficiency-dependent Seebeck coefficient and electrical properties of mesoporous La0.7Sr0.3MnO3-x films”, Journal of Materials Chemistry A, 4, 4433-4439 (2016)
8. Jamin Lee, Alexander Efremov, Ryeo Gang Son, Seung Pil Pack, Hyun Woo Lee, Kwangsoo Kim and Kwang-Ho Kwon, “Ammonia-based plasma treatment of single-walled carbon nanotube thin films for bio-immobilization”, Carbon, 105, p430-437 (2016)
9. Junmyung Lee, Alexander Efremov, Byung Jun Lee, and Kwang-Ho Kwon, “Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr + Ar Inductively Coupled Plasmas”, Plasma chemistry and plasma processing , 36, p1571-1588 (2016)
10. Jongchan Lee, Alexander Efremov, Kwangsoo Kim and Kwang-Ho Kwon, “Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2 mixing ratio”, Japanese Journal of Applied Physics 55, 106201 (2016)
11. Jaemin Lee, Alexander Efremov, Junmyung Lee, Kwangsoo Kim, and Kwang-Ho Kwon, Etching Characteristics of Carbon Nanotube Thin Films in O2/Ar Plasma”, J. Nanosci. Nanotechnol. 16,12021-12027 (2016)
12. Byung Jun Lee, Boung Jun Lee, Alexander Efremov, Ji-Woon Yang, and Kwang-Ho Kwon, “Etching Characteristics and Mechanisms of MoS2 2D Crystals in O2/Ar Inductively Coupled Plasma”, J. Nanosci. Nanotechnol. vol. 16, 11201-11209 (2016)
13. Yong Geun Kim, Jummyung Lee, Hyun Woo Lee, and Kwang-Ho Kwon, “Etching Chracteristics of Graphene Film for Electronic Devices Using Inductively Coupled Plasma”, J. Nanosci. Nanotechnol. 16,11986-11991 (2016)
14. Woojae Han, Byungwook Yoo, Kwang-Ho Kwon, Hyung Hee Cho, and Hyung-Ho Park, “Fluorine ligand exchange effect in poly (vinylidenefluoride-co-hexafluoropropylene) with embedded fluorinated barium titanate nanoparticles” Thin Solid Films, Vol 619, 17-24 (2016)
15. Nomin Lim, Daewoong Hong, Jaehwa Jeong, Hyun Woo Lee and Kwang-Ho Kwon, “Surface Modification Due to Plasma Treatment of an Aluminum Electrode for a Triboelectric Generator”, J. Nanosci Nanotechnol. vol. 17, 3328-3332 (2017)
16. Nomin Lim, Daewoong Hong, Jaehwa Jeong, Hyun Woo Lee and Kwang-Ho Kwon, “Inductively Coupled Plasma Surface Modification of Polyethylene Terephthalate and Application in a Trib oelectric Generator” Thin Solid Films, Vol. 637, 27-31(2017)
17. Alexander Efremov, Junmyung Lee and Kwang-Ho Kwon, “A comparative study of CF4, Cl2 and HBr +Ar Inductively coupled plasmas for dry etching applications”, Thin Solid Films, vol.629, 39-48 (2017)
18. Jongchan Lee, Alexander Efremov, Kwangsoo Kim, and Kwang-Ho Kwon, “On the Etching Mechanisms of SiC Thin Films in CF4/CH2F2/N2/Ar Inductively Coupled Plasma” Plasma Chem. Plasma Process, Vol. 37(2), 489-509 (2017)
19. Boung Jun Lee, Byung Jun Lee, Jongchan Lee, Ji-Woon Yang, and Kwang-Ho Kwon, “Effects of plasma treatment on the electrical reliability of multilayer MoS2 field-effect transistors”,Thin Solid Films, vol.637, 32-36 (2017)
20. Jaemin Lee, Alexander Efremov and Kwang-Ho Kwon, “On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios”, Vacuum, 214-223, (2018) Published
21. Junmyung Lee, Jihun Kim, Byung Jun Lee, Jongchan Lee, Hyun Woo Lee, Min-Hee Hong, Hyung-Ho Park, Dong Il Shim, Hyung Hee Cho, and Kwang-Ho Kwon, “Characterization of Mesoporous Silica Thin Films for Application to Thermal Isolation Layer”, Thin Solid Films, Vol.660, 715-719, (2018).
22. Changmok Kim, Alexander Efremov, Jaemin Lee, Il Ki Han, Young-Hwan Kim, and Kwang-Ho Kwon, “Kinetics and mechanisms for ion-assisted etching of InP thin films in HBr + Cl2 + Ar inductively coupled plasma with various HBr/Cl2 mixing ratios”, Thin Solid Films, Vol.660, 590-595, (2018).
23. Jongchan Lee, Jaehyun Moon, Jae-Eun Pi, Seong-Deok Ahn, Himchan Oh, Seung-Youl Kang, and Kwang-Ho Kwon, “High mobility ultra-thin crystalline indium oxide thin film transistor using atomic layer deposition”, Applied physics letters, Vol.113, 112102, (2018).
24. Yong Geun Kim, Nomin Lim, Jihun Kim, Changmok Kim, Junmyung Lee, Kwang-Ho Kwon, “Study on the surface energy characteristics of polydimethylsiloxane (PDMS) films modified by C4F8/O2/Ar plasma treatment”, Applied Surface Science, Vol. 31, 198-203, (2019)
25. Jaemin Lee, Changmok Kim, Hyun Woo Lee, and Kwang-Ho Kwon, “Sidewall chemistry of nano-contact patterns in C4F8+CH2F2+O2+Ar inductively coupled plasmas”, Thin Solid Films, Vol.669, 227-234, (2019)
26. Byung Jun Lee, Alexander Efremov, Junmyung Lee, and Kwang-Ho Kwon, “Etching kinetics and mechanisms of SiC thin films in F‑, Cl- and Br‑based plasma chemistries”, Plasma Chemistry and Plasma Processing, Vol.39, 325-338, (2019)
27. Byung Jun Lee, Alexander Efremov, Jihun Kim, Changmok Kim, and Kwang-Ho Kwon, “Peculiarities of Si and SiO2 Etching Kinetics in HBr + Cl2 + O2 Inductively Coupled Plasma”, Plasma Chemistry and Plasma Processing, Vol 39, 339-358, (2019)
28. Byung Jun Lee, Alexander Efremov, Jihun Kim, Changmok Kim, and Kwang-Ho Kwon, “Plasma parameters, gas-phase chemistry and Si/SiO2 etching mechanisms in HBr+Cl2+O2 gas mixture: Effect of HBr/O2 mixing ratio”, Vacuum, Vol 163, 110-118, (2019) Online pulished
29. Nomin Lim, Alexander Efremov, and Kwang-Ho Kwon, “Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8+Ar inductively coupled plasma”, Thin Solid Films, Vol. 685, 97-107, (2019)
30. Junmyung Lee, Jihun Kim, Changmok Kim, Alexander Efremov, Hyun Woo Lee and Kwang-Ho Kwon, “Etching Kinetics and Surface Conditions for SiOxNy Thin Films in CF4+CHF3+O2 Inductively Coupled Plasma”, Plasma Chemistry and Plasma Processing, Vol.39 (4) 1127-1144, (2019)
31. Nomin Lim, Il Ki Han, Young-Hwan Kim, Hyun Woo Lee, Yunsung Cho, Jeong-Su Kim, Yeon-Ho Im and Kwang-Ho Kwon, “Abnomal characteristics of etched profile on thick dielectrics for MEMS in inductively coupled plasma”, Vacuum, 166, 45-49 (2019)
32. Nomin Lim, Alexander Efremov, Hyun-Gyu Hwang, Sahn Nahm and Kwang-Ho Kwon, “Etching Kinetics and Surface Conditions for KNbxOy Thin Films with Fluorine‑ and Chlorine‑Based Plasma Chemistries”, Plasma Chemistry and Plasma Processing, 40, 625-640 (2020)
33. Yong Geun Kim, Changmok Kim, Junmyung Lee, Hyun Woo Lee and Kwang-Ho Kwon, “Direct transfer of graphene by control of polydimethylsiloxane surface energy”, Thin Solid Films, Vol.697, 137847 (2020), 08, Feb. (2020)
34. Junmyung Lee, Yunho Nam, Jongchan Lee, and Kwang-Ho Kwon, “Study on the Etching characteristics of SiON thin films using the liquefied perfluorocarbon alternative gas of C6F12O”, Plasma Science & Technology, Vol. 22, (2020)
35. Jaemin Lee, Hyun Woo Lee, Kwang-Ho Kwon, “Characteristics of etching residues on the upper sidewall after anisotropic plasma etching of silicon”, Applied Surface Science, Vol. 517, 146189 (2020)
36. Byung Jun Lee, Alexander Efremov, Yunho Nam, and Kwang-Ho Kwon, “Plasma Parameters and Silicon Etching Kinetics in C4F8+O2+Ar Gas Mixture: Effect of Component Mixing Ratios”, Plasma Chemistry and Plasma Processing, -Accept