- Byungwhan Kim, Sang Hee Kwon, Kwang-Ho Kwon, Kyu-Ha Baek, Jin Ho Lee, Dong Hwan Kim, and Gary S. May, “Statistical Characterization of Process-Induced Plasma Damage”, Materials and Manufacturing Processes, 24: 610–614, 2009 (ISSN: 1042-6914)
- Moonkeun Kim, Beomseok Hwang, Yong-Hyun Ham, Jaehwa Jeong, Nam Ki Min, and Kwang-Ho Kwon, “Design, fabrication, and experimental demonstration of a piezoelectric cantilever for a low resonant frequency microelectromechanical system vibration energy harvester”, J. Micro/Nanolith. MEMS MOEMS 11(3), 033009-1-7 (Jul-Sep 2012)
- Byung Jun Lee, et al., "On the Control of Plasma Chemistry and Silicon Etching Kinetics in Ternary HBr + Cl2 + O2 Gas system : Effects of HBr/O2 and Cl2/O2 Mixing ratios." Science of Advanced Materials, Vol. 12(5) (2020) pp. 628-640.
- Jaemin Lee, Jihun Kim, Junmyung Lee, Hyun Woo Lee, and Kwang-Ho Kwon, "Plasma Etching of SiON Films Using Liquified C7F14 Gas as Perfluorocarbon Alternative." Science of Advanced Materials, Vol. 12(5) (2020) pp.641-646.
Publication/SCIE Papers